CVE-2022-26504

HIGHCVSS 8.8/10EPSS 2.47%

Last modified

CVE-2022-26504 is a high-severity vulnerability rated 8.8/10 on the CVSS scale. Improper authentication in Veeam Backup & Replication 9.5U3, 9.5U4,10.x and 11.x component used for Microsoft System Center Virtual Machine Manager (SCVMM) allows attackers execute arbitrary code via Veeam.Backup.PSManager.exe. EPSS estimates a 2.47% chance of exploitation in the next 30 days.

Description

Improper authentication in Veeam Backup & Replication 9.5U3, 9.5U4,10.x and 11.x component used for Microsoft System Center Virtual Machine Manager (SCVMM) allows attackers execute arbitrary code via Veeam.Backup.PSManager.exe

Metrics

CVSS 3.1
8.8/10

CVSS:3.1/AV:N/AC:L/PR:L/UI:N/S:U/C:H/I:H/A:H

EPSS Probability
2.47%

82.5th percentile

Probability of exploitation in the next 30 days. Learn more

Weakness Enumeration

Affected Software

VendorProductVersions
VeeamVeeam Backup \& Replication>= 10.0.0.4442, < 10.0.1.4854
VeeamVeeam Backup \& Replication>= 11.0.0.825, < 11.0.1.1261
VeeamVeeam Backup \& Replication9.5.0.1536
VeeamVeeam Backup \& Replication9.5.4.2615
VeeamVeeam Backup \& Replication10.0.1.4854
VeeamVeeam Backup \& Replication11.0.1.1261

References

Timeline

Published
Last Modified
Status
Modified

Frequently Asked Questions

What is CVE-2022-26504?
Improper authentication in Veeam Backup & Replication 9.5U3, 9.5U4,10.x and 11.x component used for Microsoft System Center Virtual Machine Manager (SCVMM) allows attackers execute arbitrary code via Veeam.Backup.PSManager.exe
How severe is CVE-2022-26504?
CVE-2022-26504 has a CVSS score of 8.8/10 (HIGH severity). The EPSS model estimates a 2.47% probability of exploitation in the next 30 days.
How do I fix CVE-2022-26504?
Check the vendor references and advisories linked above for patched versions and mitigation guidance. You can also run a Strix scan to test if your systems are affected.

Are you affected by CVE-2022-26504?

Run a free Strix scan to check your systems for this vulnerability.

Scan your code now

Source: NVD / NIST