CVE-2026-21064
HIGHCVSS 7/10EPSS 0.11%
Last modified
CVE-2026-21064 is a high-severity vulnerability rated 7/10 on the CVSS scale. Improper access control in Weaver prior to SMR Aug-2026 Release 1 allows local attackers to cause device inoperability.. EPSS estimates a 0.11% chance of exploitation in the next 30 days.
Description
Improper access control in Weaver prior to SMR Aug-2026 Release 1 allows local attackers to cause device inoperability.
Metrics
CVSS:4.0/AV:L/AC:L/AT:N/PR:N/UI:N/VC:N/VI:H/VA:H/SC:N/SI:N/SA:N/E:X/CR:X/IR:X/AR:X/MAV:X/MAC:X/MAT:X/MPR:X/MUI:X/MVC:X/MVI:X/MVA:X/MSC:X/MSI:X/MSA:X/S:X/AU:X/R:X/V:X/RE:X/U:X
Weakness Enumeration
Affected Software
Source: CNA advisory (CVE.org). NVD analysis pending.
| Vendor | Product | Versions |
|---|---|---|
| Samsung Mobile | Samsung Mobile Devices | All versions |
References
Timeline
- Published
- Last Modified
- Status
- Received
Frequently Asked Questions
What is CVE-2026-21064?
Improper access control in Weaver prior to SMR Aug-2026 Release 1 allows local attackers to cause device inoperability.
How severe is CVE-2026-21064?
CVE-2026-21064 has a CVSS score of 7/10 (HIGH severity). The EPSS model estimates a 0.11% probability of exploitation in the next 30 days.
How do I fix CVE-2026-21064?
Check the vendor references and advisories linked above for patched versions and mitigation guidance. You can also run a Strix scan to test if your systems are affected.
How Strix Helps
- Uncovering a hidden BOLA in Appsmith's snapshot logicStrix autonomously discovered a BOLA/IDOR vulnerability in Appsmith's snapshot deletion path.
- Autonomous PentestingAI agents that find and validate exploitable vulnerabilities like this one across your applications.
- PR ReviewsPentest every pull request so vulnerable code is caught before it ships to production.
- AI Penetration TestingHow AI-driven penetration testing continuously covers your attack surface.
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Are you affected by CVE-2026-21064?
Run a free Strix scan to check your systems for this vulnerability.
Scan your code nowSource: NVD / NIST