CVE-2025-66585

HIGHCVSS 7.3/10EPSS 0.19%

Last modified

CVE-2025-66585 is a high-severity vulnerability rated 7.3/10 on the CVSS scale. In AzeoTech DAQFactory release 20.7 (Build 2555), a use after free vulnerability can be exploited to cause memory corruption while parsing specially crafted .ctl files. This could allow an attacker to execute code in the context of the current process.. EPSS estimates a 0.19% chance of exploitation in the next 30 days.

Description

In AzeoTech DAQFactory release 20.7 (Build 2555), a use after free vulnerability can be exploited to cause memory corruption while parsing specially crafted .ctl files. This could allow an attacker to execute code in the context of the current process.

Metrics

CVSS 3.1
7.8/10

CVSS:3.1/AV:L/AC:L/PR:N/UI:R/S:U/C:H/I:H/A:H

CVSS 4.0
7.3/10

CVSS:4.0/AV:L/AC:H/AT:N/PR:N/UI:P/VC:H/VI:H/VA:H/SC:N/SI:N/SA:N/E:X/CR:X/IR:X/AR:X/MAV:X/MAC:X/MAT:X/MPR:X/MUI:X/MVC:X/MVI:X/MVA:X/MSC:X/MSI:X/MSA:X/S:X/AU:X/R:X/V:X/RE:X/U:X

EPSS Probability
0.19%

9.2th percentile

Probability of exploitation in the next 30 days. Learn more

Weakness Enumeration

Affected Software

VendorProductVersions
AzeotechDaqfactory< 21.1

References

Timeline

Published
Last Modified
Status
Modified

Frequently Asked Questions

What is CVE-2025-66585?
In AzeoTech DAQFactory release 20.7 (Build 2555), a use after free vulnerability can be exploited to cause memory corruption while parsing specially crafted .ctl files. This could allow an attacker to execute code in the context of the current process.
How severe is CVE-2025-66585?
CVE-2025-66585 has a CVSS score of 7.3/10 (HIGH severity). The EPSS model estimates a 0.19% probability of exploitation in the next 30 days.
How do I fix CVE-2025-66585?
Check the vendor references and advisories linked above for patched versions and mitigation guidance. You can also run a Strix scan to test if your systems are affected.

Are you affected by CVE-2025-66585?

Run a free Strix scan to check your systems for this vulnerability.

Scan your code now

Source: NVD / NIST